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Journal Articles

Characterization of residual defects in cubic silicon carbide subjected to hot-implantation and subsequent annealing

Ito, Hisayoshi; Oshima, Takeshi; Aoki, Yasushi; Abe, Koji*; Yoshikawa, Masahito; Nashiyama, Isamu; Okumura, Hajime*; Yoshida, Sadafumi*; Uedono, Akira*; Tanigawa, Shoichiro*

Journal of Applied Physics, 82(11), p.5339 - 5347, 1997/12

https://doi.org/10.1063/1.366301

Times Cited Count：13 Percentile：57.44(Physics, Applied)

no abstracts in English

Journal Articles

Intrinsic defects in cubic silicon carbide

Ito, Hisayoshi; Kawasuso, Atsuo; Oshima, Takeshi; Yoshikawa, Masahito; Nashiyama, Isamu; Tanigawa, Shoichiro*; *; Okumura, Hajime*; Yoshida, Sadafumi*

Physica Status Solidi (A), 162, p.173 - 198, 1997/00

https://doi.org/10.1002/1521-396X(199707)162:1<173::AID-PSSA173>3.0.CO;2-W

Times Cited Count：132 Percentile：97.83(Materials Science, Multidisciplinary)

no abstracts in English

Journal Articles

Characterization of defects in hot-implanted 3C-SiC epitaxially grown on Si

Ito, Hisayoshi; Aoki, Yasushi; Oshima, Takeshi; Yoshikawa, Masahito; Nashiyama, Isamu; Okumura, Hajime*; Yoshida, Sadafumi*

Silicon Carbide and Related Materials 1995 (Institute of Physics Conf. Series,No. 142), 0, p.549 - 552, 1996/00

no abstracts in English

Journal Articles

Hot-implantation of nitrogen and aluminumions into SiC semiconductor

Ito, Hisayoshi; Oshima, Takeshi; Aoki, Yasushi; Yoshikawa, Masahito; Nashiyama, Isamu; Okumura, Hajime*; Yoshida, Sadafumi*

14th Symp. on Materials Science and Engineering, Research Center of Ion Beam Technology, Hosei Univ., 0, p.147 - 150, 1995/00

no abstracts in English